| 用双光束干涉制作二维光子晶体 |
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| 引用本文： | 李景娟,张新平,翟天瑞,王丽,江少林,王越. 用双光束干涉制作二维光子晶体[J]. 大学物理, 2012, 31(5): 54-57 |
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| 作者姓名： | 李景娟 张新平 翟天瑞 王丽 江少林 王越 |
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| 作者单位： | 北京工业大学应用数理学院,北京,100124 |
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| 摘 要： | 利用双光束干涉,在光敏材料上制作光子晶体结构.通过改变两束光之间的夹角可以改变制备样品的周期.改变曝光次数以及两次曝光时干涉条纹的夹角可以分别得到一维、二维正方晶格以及二维三角晶格结构的光子晶体.
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| 关 键 词： | 双光束干涉 干涉光刻 光子晶体制作 |
Fabrication of two-dimensional photonic crystal by double-beam interference |
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| LI Jing-juan , ZHANG Xin-ping , ZHAI Tian-rui , WANG Li , JIANG Shao-lin , WANG Yue. Fabrication of two-dimensional photonic crystal by double-beam interference[J]. College Physics, 2012, 31(5): 54-57 |
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| Authors: | LI Jing-juan ZHANG Xin-ping ZHAI Tian-rui WANG Li JIANG Shao-lin WANG Yue |
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| Affiliation: | (College of Applied Sciences,Beijing University of Technology,Beijing 100124,China) |
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| Abstract: | The fabricate photonic crystal on photosensitive material is proposed by double-beam interference.The period of the structure can be controlled by changing the angle between two beams.The one-dimensional grating structure and two-dimensional photonic crystals with square lattice and triangular lattice should be obtained by changing the time of exposure and the angle between the interference fringe of two exposures. |
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| Keywords: | double-beam interference interference lithography fabrication of photonic crystal |
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