首页 | 本学科首页   官方微博 | 高级检索  
     检索      


Optical transitions in Ge nanocrystals formed by high-pressure annealing of Ge ion implanted SiO2 films
Authors:IE Tyschenko  AB Talochkin  KS Zhuravlev
Institution:a Department 10, Institute of Semiconductor Physics, Siberian Branch of the Russian Academy of Sciences, Lavrentieva str, 13, 630090 Novosibirsk, Russian Federation
b Nanoparc GmbH, Bautzner Landstrasse 45, D-01454 Dresden-Rossendorf, Germany
Abstract:Optical transitions in Ge nanocrystals formed by high-pressure annealing of the Ge+ ion implanted SiO2 films have been studied by Raman and photoluminescence spectroscopy. It has been found that the E1,E1+Δ1 Raman resonance shift observed from the unstrained and hydrostatically compressed nanocrystals corresponds to the quantization of the electron-hole state spectrum of the Ge band. It has also been established that the appearance of a green photoluminescence band centered at 420-520 nm correlates with the formation of strained nanocrystals. Comparisons of the PL data with HRTEM results have been made, which suggest that the green PL arises from strained Ge nanocrystals of a radius of less than 5 nm. The direct electron-hole recombination at Γ is discussed as a possible origin of the observed photoluminescence band.
Keywords:61  72  T  78  55  61  46  61  50  K
本文献已被 ScienceDirect 等数据库收录!
设为首页 | 免责声明 | 关于勤云 | 加入收藏

Copyright©北京勤云科技发展有限公司  京ICP备09084417号