等离子体浸没离子注入非导电聚合物的适应性及栅网诱导效应的研究

本文建立了绝缘材料等离子体浸没离子注入过程的动力学Particle-in-cell(PIC)模型, 将二次电子发射系数直接与离子注入即时能量建立关联, 研究了非导电聚合物厚度、介电常数和二次电子发射系数对表面偏压电位的影响规律以及栅网诱导效应. 研究结果表明: 非导电聚合物较厚时, 表面自偏压难以实现全方位离子注入, 栅网诱导可以间接为非导电聚合物提供偏压, 并抑制二次电子发射, 为厚大非导电聚合物表面等离子体浸没离子注入提供了有效途径.

The study on adaptability and effect of mesh-inducing for plasma immersion ion implantation on non-conductor polymer

Plasma immersion ion implantation (PIII) of non-conductor polymer materials is inherently difficult because the voltage across the sheath is reduced by the voltage drop across the insulator due to dielectric capacitance and charge accumulation on the insulator surface. Based on the particle-in-cell (PIC) model, the secondary electron emission (SEE) coefficient is related to the instant energy of implanting ions. Statistical results can be obtained through scouting each ion in the plasma sheath. The evolution of surface potential is simulated for ion implantation on insulator materials. The effects of thickness, dielectric constant and SEE coefficient on the surface bias potential and the effect of mesh-inducing are studied. For thicker non-conductor polymer, it is difficult to achieve omni-directional implantation by self-bias. The mesh-assisted PIII can improve the equivalent surface potential, suppress the emission of secondary electrons and provide an effective way for ion implantation on insulator.