| 薄膜光学常数的椭偏测量 |
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| 引用本文： | 王晓峰,杨俊波,常胜利,王飞. 薄膜光学常数的椭偏测量[J]. 大学物理实验, 2011, 24(1): 11-13 |
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| 作者姓名： | 王晓峰 杨俊波 常胜利 王飞 |
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| 作者单位： | 国防科技大学; |
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| 摘 要： | 利用光谱型椭偏仪测量了镀在熔石英玻璃基片上的氟化镁薄膜在300～850nm波长范围内的椭偏参数.并利用Levenberg-Marquardt算法.反演出了氟化镁薄膜在该波长范围内的色散曲线.通过与纯氟化镁体材料的色散曲线比较,发现所镀的氟化镁薄膜的折射率略小于体材料的折射率.
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| 关 键 词： | 椭偏测量 光学薄膜 色散曲线 反演 |
Optical Constants of MgF_2 Films Measurement by Spectroscopic Ellipsometry |
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| WANG Xiao-feng,YANG Jun-bo,CHANG Sheng-li,WANG Fei. Optical Constants of MgF_2 Films Measurement by Spectroscopic Ellipsometry[J]. Physical Experiment of College, 2011, 24(1): 11-13 |
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| Authors: | WANG Xiao-feng YANG Jun-bo CHANG Sheng-li WANG Fei |
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| Affiliation: | WANG Xiao-feng,YANG Jun-bo,CHANG Sheng-li,WANG Fei(National University of Defense Technology,Hunan,Changsha 410073) |
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| Abstract: | The ellipsometric parameters of MgF2 films in the wavelength range of 300nm~850nm on fused silica are measured by spectroscopic ellipsometer.The dispersion curve of the films is acquired by Levenberg-Marquardt arithmetic.The results show that the refraction index of the films is smaller than that of the bulk materials. |
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| Keywords: | ellipsometry optical film dispersion curve inversion |
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