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Suppression of Photoinduced BBO Defects Generation on TIO2(110) by Water
作者姓名:Chen-biao Xu  Wen-shao Yang  Qing Guo  Dong-xu Dai  Mao-du Chen  Xue-ming Yang
作者单位:[1]School of Physics and Optoelectronic Engineering, Dalian University of Technology, Dalian 116024,China [2]State Key Laboratory of Molecular Reaction Dynamics, Dalian Institute of Chemical Physics, Dalian 116023, China
摘    要:We have investigated creation of variable concentrations of defects on TIO2(110)-(1×1) surface by 266 nm laser using temperature programmed desorption technique. Oxygen-vacancy defects can be easily induced by ultraviolet light, the defects concentration has a linear dependence on power density higher than 50 mW/cm2 for 90 s irradiation. No observation of O2 molecule and Ti atom desorption suggests that UV induced defects creation on TiO2(110)-(1×1) is an effective and gentle method. With pre-dosage of thin films of water, the rate of defects creation on TiO2(110)-(1×1) is slower at least by two orders of magnitude than bare TiO2(110)-(1×1) surface. Further investigations show that water can be more easily desorbed by UV light, and thus desorption of bridging oxygen is depressed.

关 键 词:纳米TiO2  空位缺陷  BBO晶体  程序升温脱附  光致    缺陷浓度  氧分子
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