Suppression of Photoinduced BBO Defects Generation on TIO2(110) by Water |
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作者姓名: | Chen-biao Xu Wen-shao Yang Qing Guo Dong-xu Dai Mao-du Chen Xue-ming Yang |
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作者单位: | [1]School of Physics and Optoelectronic Engineering, Dalian University of Technology, Dalian 116024,China [2]State Key Laboratory of Molecular Reaction Dynamics, Dalian Institute of Chemical Physics, Dalian 116023, China |
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摘 要: | We have investigated creation of variable concentrations of defects on TIO2(110)-(1×1) surface by 266 nm laser using temperature programmed desorption technique. Oxygen-vacancy defects can be easily induced by ultraviolet light, the defects concentration has a linear dependence on power density higher than 50 mW/cm2 for 90 s irradiation. No observation of O2 molecule and Ti atom desorption suggests that UV induced defects creation on TiO2(110)-(1×1) is an effective and gentle method. With pre-dosage of thin films of water, the rate of defects creation on TiO2(110)-(1×1) is slower at least by two orders of magnitude than bare TiO2(110)-(1×1) surface. Further investigations show that water can be more easily desorbed by UV light, and thus desorption of bridging oxygen is depressed.
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关 键 词: | 纳米TiO2 空位缺陷 BBO晶体 程序升温脱附 光致 水 缺陷浓度 氧分子 |
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