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J(Si,H) Coupling Constants in Nonclassical Transition‐Metal Silane Complexes
Authors:Prof. Dr. Wolfgang Scherer  M. Sc. Petra Meixner  Dipl.‐Phys. Kilian Batke  Dr. José E. Barquera‐Lozada  Prof. Dr. Klaus Ruhland  M. Sc. Andreas Fischer  Dr. Georg Eickerling  Dr. Klaus Eichele
Affiliation:1. Institut für Physik, Universit?t Augsburg, Augsburg, Germany;2. Instituto de Química, Universidad Nacional Autónoma de México, Ciudad Universitaria, Mexico;3. Institut für Anorg. Chemie, Universit?t Tübingen, Tübingen, Germany
Abstract:We will outline that the sign and magnitude of J(Si,H) coupling constants provide a highly sensitive tool to measure the extent of Si?H bond activation in nonclassical silane complexes. Up to now, this structure–property relationship was obscured by erroneous J(Si,H) sign determinations in the literature. These new findings also help to identify the salient control parameters of the Si?H bond activation process in nonclassical silane complexes.
Keywords:charge density  coupling constants  MO analysis  NMR spectroscopy  nonclassical silane complexes
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