Polysorbate20 adsorption layers below and above the critical micelle concentration over aluminum; cloud point and inhibitory role investigations at the solid/liquid interface

Non‐ionic polysorbate20 surfactant was used to produce adsorption protective layers below and above its critical micelle concentration (CMC) at the liquid/solid interface. The well‐ordered accumulation of surfactant molecules on the metal surface below the CMC led to the formation of oriented surfactant monolayers. On the other hand, as the surfactant concentration increased above the CMC, the monodisperse micelles, free surfactant molecules and oriented surfactant monolayers undergo aggregate formation and produce a turbid solution. The gradual increase in the number and size of aggregates leads to phase separation and hence disassembled protective layers that allow easier penetration of corrosive HCl at a metal surface. This was demonstrated by inhibition efficiency, activation energy, enthalpy and entropy of activation values. Two‐dimensional irregular crystalline sheets accumulated at the surface of aluminum, as shown by scanning electron micrographs. Adsorption of polysorbate20 at the aluminum surface exhibited a Temkin isotherm fit. Larger desorption processes at the cloud point demonstrate aggregate formation and phase separation, and hence poorer adsorption layers at the metal surface. Copyright © 2012 John Wiley & Sons, Ltd.