Angle- and energy-dependent core-level photoelectron energy loss studies in Al and In |
| |
Authors: | RS Williams PS Wehner G Apai J Stöhr DA Shirley SP Kowalczyk |
| |
Institution: | Materials and Molecular Research Division, Lawrence Berkeley Laboratory and Department of Chemistry, University of California, Berkeley, California 94720 U.S.A.;Max-Planck Institut für Festkörperforschung, Stuttgart W. Germany |
| |
Abstract: | Electron energy loss structures of Al and In core-level photoemission spectra, in particular surface and bulk plasmon losses, have been investigated as functions of photon energy (i.e., photoelectron kinetic energy). These studies utilized synchrotron radiation to provide a variable photon source in the ultra-soft X-ray region, thus allowing these loss processes to be studied at photoelectron kinetic energies for which the mean free path of the electrons is minimal. The Al plasmon loss structure was also studied with soft X-ray radiation in an angle-resolved mode, allowing the variation of effective photoelectron sampling depth with different electron take-off (collection) angles. These results for the relative intensity of the bulk and surface plasmons as a function of electron kinetic energy and electron exit angle are in qualitative agreement with the predictions of ?unji? and ?ok?evi?. The core-level binding energies of surface atoms have also been studied with the result that no significant shift has been observed with respect to bulk-atom core levels. |
| |
Keywords: | |
本文献已被 ScienceDirect 等数据库收录! |
|