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Ultrafast transverse thermoelectric response in c‐axis inclined epitaxial La0.5Sr0.5CoO3 thin films
Authors:Lan Yu  Yong Wang  Pengxiang Zhang  Hanns‐Ulrich Habermeier
Institution:1. Institute of Advanced Materials for Photoelectrons, Faculty of Materials Science and Engineering, Kunming University of Science and Technology, Kunming 650051, P.R. China;2. Max Planck Institute for Solid State Research, Heisenbergstra?e 1, 70569 Stuttgart, Germany;3. Institut Jean Lamour, UMR 7198‐CNRS, Université de Lorraine, 54011 Nancy, FrancePhone: +33 (0) 83584256, Fax: +33 (0) 83534764
Abstract:Ultrafast transverse thermoelectric voltage response has been observed in c‐axis inclined epitaxial La0.5Sr0.5CoO3thin films. Voltage signals with the rise time of 7 ns have been detected under the irradiation of pulse laser with duration of 28 ns. A concept, named response rate ratio, has been proposed to evaluate the intrinsic response rate, and this ratio in La0.5Sr0.5CoO3is smaller than that in other reported materials. The low resistivity is thought to be responsible for the ultrafast response, as low resistivity induces small optical penetration depth, and response time has a monotonous increasing relationship with this depth.
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Keywords:epitaxy  thin films  transverse thermoelectric effect  ultrafast response  La0  5Sr0  5CoO3
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