1. Helmholtz‐Zentrum Berlin für Materialien und Energie GmbH, Schwarzschildstr. 3, 12489 Berlin, Germany;2. HTW Berlin – University of Applied Sciences, Wilhelminenhofstr. 75a, 12459 Berlin, Germany
Abstract:
Diffraction micro gratings have been written in ZnO:Al thin films using a picosecond laser operating at 355 nm. Micro gratings of 20 µm diameter with a period of 860 nm show a groove depth up to 120 nm. The total transmittance of square‐centimeter‐size grating‐textured ZnO:Al films was almost unchanged after grating formation, while the sheet resistance increased moderately. The textured films reached haze values of 9% at 700 nm. This simple texturing method can be applied also to ZnO:Al films that cannot be texture etched.
