Advances in square arrays through self‐assembly and directed self‐assembly of block copolymers |
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| Authors: | Christopher G. Hardy Chuanbing Tang |
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| Affiliation: | Department of Chemistry and Biochemistry, University of South Carolina, Columbia, South Carolina 29208 |
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| Abstract: | This review covers recent advances in developing square arrays in thin films using block copolymers. Theoretical and experimental results from self‐assembly of block copolymers in bulk and thin films, directed self‐assembly of block copolymers confined in small wells, on substrates with arrays of posts, and on chemically nanopatterned substrates, as well as applications as nanolithography are reviewed. Some future work and hypothesis are discussed. © 2012 Wiley Periodicals, Inc. J Polym Sci Part B: Polym Phys, 2013 |
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| Keywords: | block copolymers lithography self‐assembly |
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