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Analysis of absorption enhancement in tailor‐made periodic polycrystalline silicon microarrays
Authors:Veit Preidel  Daniel Lockau  Tobias Sontheimer  Franziska Back  Eveline Rudigier‐Voigt  Bernd Rech  Christiane Becker
Institution:1. Young Investigator Group Nanostructured Silicon for Photovoltaic and Photonic Implementations (Nano‐SIPPE), Helmholtz‐Zentrum Berlin für Materialien und Energie GmbH, Kekuléstr. 5, 12489 Berlin, Germany;2. Institut Silizium Photovoltaik, Helmholtz‐Zentrum Berlin für Materialien und Energie GmbH, Kekuléstr. 5, 12489 Berlin, Germany;3. SCHOTT AG, Hattenbergstra?e 10, 55122 Mainz, Germany
Abstract:We present a design study of 3D photonic poly‐Si microarchitectures on 2 µm periodically textured glass substrates for application as absorber layers in crystalline Si thin‐film solar cells. Different arrays of microholes and microcones were fabricated in a low‐cost process, by combining high rate electron beam evaporation, nanoimprint technology and self‐organized solid phase crystallization. Two promising designs exhibiting strong absorption enhancement were identified by optical analysis. High angular acceptance and calculated maximum achievable short‐circuit current density of 27.6 mA/cm2 for an effective Si thickness of 1.1 µm highlight the optical potential of these microarchitectures as broadband absorbers in polycrystalline Si thin‐film solar cells.
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Keywords:polycrystalline materials  silicon  solar cells  electron‐beam evaporation  light trapping  nanoimprint lithography
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