Characterization of surface composition on Alloy 22 in neutral chloride solutions |
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Authors: | Dmitrij Zagidulin Xiangrong Zhang Jigang Zhou James J. Noël David W. Shoesmith |
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Affiliation: | 1. Surface Science Western and Department of Chemistry, University of Western Ontario, , London, Ontario, N6A 5B7 Canada;2. Canadian Light Source Inc, University of Saskatchewan, , Saskatoon, Saskatchewan, S7N 0X4 Canada |
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Abstract: | The composition of anodically grown oxide films on Alloy 22, a Ni‐Cr‐Mo(W) alloy, has been investigated in 5 mol l?1 NaCl at room temperature using X‐ray photoelectron spectroscopy and time‐of‐flight secondary ion mass spectrometry. For applied potentials up to 0.2 V (vs Ag/AgCl (saturated KCl solution)), a Cr(III) oxide barrier layer develops at the alloy/oxide interface accounting for the excellent passivity demonstrated to prevail in this potential region by previous electrochemical impedance spectroscopy measurements. At higher potentials, this layer is destroyed by defect injection as Cr(III) is oxidized to the more soluble Cr(VI). The overall oxide/hydroxide film thickness is, however, increased as Mo(VI)/W(VI) species accumulate at the oxide solution interface. The potential of 0.2 V at which the barrier layer switches from growth to destruction coincides with the previously demonstrated threshold potential for the initiation of crevice corrosion. Copyright © 2012 John Wiley & Sons, Ltd. |
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Keywords: | Alloy 22 passive film surface analysis |
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