Influence of laser power on deposition of the chromium atomic beam in laser standing wave |
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Authors: | WenTao Zhang BaoHua Zhu BaoWu Zhang and TongBao Li |
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Institution: | (1) Guilin University of Electronic Technology, Guilin, 541004, China;(2) Department of Physics, Tongji University, Shanghai, 200092, China |
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Abstract: | One-dimensional deposition of collimated Cr atomic beam focused by a near-resonant Gaussian standing-laser field with wavelength
of 425.55 nm is examined from particle-optics approach by using an adaptive step size, fourth-order Runge-Kutta type algorithm.
The influence of laser power on deposition of atoms in laser standing wave is discussed and the simulative result shows that
the FWHM of nanometer stripe is 102 nm and contrast is 2:1 with laser power equal to 3 mW, the FWHM is 1.2 nm and contrast
is 32:1 with laser power equal to 16 mW, but with laser power increase, equal to 50 mW, the nonmeter structure forms the multi-crests
and exacerbates.
Supported by the Science Foundation of Guangxi Education Department (Grant No. 200807MS006) |
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Keywords: | atom lithography laser standing wave laser power |
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