Growth and electrical properties of liquid phase epitaxial layers of GaxIn1-xP lattice-matched to GaAs substrates

From the measurement of the evaporation rate of phosphorus the favourable conditions for the layer growth were determined. Further, we have studied the influence of zinc and silicon on the growth and the morphology. The mobilities, the electron and hole concentrations in the temperature range from 77 to 300 K are presented. In the Si-doped samples we could not find a correlation between the silicon concentration in the melt and the donor concentrations in the layer. An estimation of the acceptor ionization energy in Zn-doped samples yields E_A = (15 ± 4) meV.