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Mononuclear precursor for MOCVD of HfO2 thin films |
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| Authors: | Baunemann Arne Thomas Reji Becker Ralf Winter Manuela Fischer Roland A Ehrhart Peter Waser Rainer Devi Anjana |
| Affiliation: | Inorganic Materials Chemistry Group, Lehrstuhl für Anorganische Chemie II, Ruhr-University Bochum, Universit?tsstr. 150, D-44780 Bochum, Germany. |
| Abstract: | We report the precursor characteristics of a novel mononuclear mixed alkoxide compound [Hf(O(i)Pr)2(tbaoac)2] and its application towards MOCVD of HfO2 thin films in a production tool CVD reactor. |
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