Vanadium- and Titanium Dioxide-Based Memristors Fabricated via Pulsed Laser Deposition |
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| Authors: | O A Novodvorsky L S Parshina A A Lotin V A Mikhalevsky O D Khramova E A Cherebylo V Ya Panchenko |
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| Institution: | 1.Institute of Laser and Information Technologies, Federal Scientific Research Centre “Crystallography and Photonics”,Russian Academy of Sciences,Shatura,Russia |
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| Abstract: | Thin TiO x and VO2 – x films are fabricated via pulsed laser deposition from metal targets with the help of mask technologies. Their memristive properties are investigated using Au/TiOx1/TiOx2/Au and Au/VO2/VO2 – x/Au thin-film structures, and the possible mechanisms of resistive switching are discussed. The structures are obtained at room temperature in an oxygen atmosphere. |
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