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Atomic modeling of the plasma EUV sources |
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| Authors: | Akira Sasaki Atsushi Sunahara Hiroyuki Furukawa Katsunobu Nishihara Takeshi Nishikawa Fumihiro Koike Hajime Tanuma |
| Affiliation: | aQuantum Beam Science Directorate, Japan Atomic Energy Agency, 8-1 Umemidai, Kizugawa-shi, Kyoto 619-0215, Japan;bInstitute for Laser Technology, Japan;cInstitute for Laser Engineering, Osaka University, Japan;dFaculty of Engineering, Okayama University, Japan;eSchool of Medicine, Kitasato University, Japan;fFaculty of Science, Tokyo Metropolitan University, Japan |
| Abstract: | We present the development of population kinetics models for tin plasmas that can be employed to design an EUV source for microlithography. The atomic kinetic code is constrained for the requirement that the model must be able to calculate spectral emissivity and opacity that can be used in radiation hydrodynamic simulations. Methods to develop compact and reliable atomic model with an appropriate set of atomic states are discussed. Specifically, after investigation of model dependencies and comparison experiment, we improve the effect of configuration interaction and the treatment of satellite lines. Using the present atomic model we discuss the temperature and density dependencies of the emissivity, as well as conditions necessary to obtain high efficiency EUV power at λ = 13.5 nm. |
| Keywords: | EUV lithography Laser produced plasma Opacity Collisional-radiative model Plasma spectroscopy |
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