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Diamond Synthesis by Thermal Plasma Chemical Vapour Deposition (TP-CVD)
Authors:M. Presia  Th. Heider  L. Schleicher  G. Nutsch
Abstract:This paper reviews results about diamond synthesis by high-temperature pyrolysis of methane in a H2/Ar-plasma. By means of a modified direct-current (DC) plasma torch with an arc power of 4–8 kW diamond growth rates in the order of about 70 μm/h were obtained. Diamond films grown on unscrached single-crystalline silicon have a diameter of about 8 mm. Scanning electron microscopy (SEM), X-ray diffractometry (XRD), and Raman scattering spectroscopy have been used to analyse diamond films characterized by a transition of a crystalline diamond centre to an amorphous random region by passing a fine-crystalline region. In the film centre (100) planes with an average size of about 25 μm were made out by SEM.
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