Direct writing and in-situ material processing by a laser-micromachining projection microscope |
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Authors: | K Osvay Z Bor B Rácz J Heitz |
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Institution: | (1) Department of Optics and Quantum Electronics, JATE University, Dóm tér 9, H-6720 Szeged, Hungary;(2) Angewandte Physik, Johannes Kepler University Linz, A-4040 Linz, Austria |
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Abstract: | The new laser micromachining projection microscope enables a surface to be viewed at high magnification with a built-in facility for micromachining of the same surface according to a predetermined pattern. A XeCl-excimer laser forms part of the device and provides bright viewing illumination in amplified spontaneous emission as well as a small laser spot of sufficient fluence to mark the sample surface. The basic characteristics of image enhancement in the excimer amplifier are presented. The advantage of such a technique for both pattern generation, surface cleaning and mask correction is demonstrated on Al, Cu and W specimens with a spatial resolution better than 3 m. |
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Keywords: | 42 60 By 81 60 Bn |
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