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用微波ECR等离子体溅射法在蓝宝石(0112)晶面上生长ZnO薄膜的研究
引用本文:汪建华,邬钦崇.用微波ECR等离子体溅射法在蓝宝石(0112)晶面上生长ZnO薄膜的研究[J].物理学报,1999,48(5):955-960.
作者姓名:汪建华  邬钦崇
作者单位:[1]武汉工业大学材料复合新技术国家重点实验室 [2]中国科学院等离子体物理研究所
基金项目:国家自然科学基金(批准号:19175046)资助的课题.
摘    要:蓝宝石上外延生长ZnO薄膜在表面波和声光器件中有重要的应用.用微波电子回旋共振(ECR)等离子体溅射法在蓝宝石(0112)晶面上外延生长了ZnO薄膜,膜无色透明,并且表面光滑,基片温度为380℃,为探索沉积工艺参数对薄膜结构的影响,用XRD对不同基片温度和沉积速率生长的ZnO薄膜进行了研究.

关 键 词:氧化锌  薄膜  蓝宝石  等离子体溅射  声光器件
收稿时间:1998-06-12

THE STUDY OF EPITAXIAL GROWTH ZnO THIN FILM ON A (0112) SAPPHIRE SUBSTRATE USING ECR PLASMA SPUTTERING METHOD
WANG JIAN-HUZ,YUAN RUN-ZHANG,WU QIN-CHONG,REN ZHAO-XING.THE STUDY OF EPITAXIAL GROWTH ZnO THIN FILM ON A (0112) SAPPHIRE SUBSTRATE USING ECR PLASMA SPUTTERING METHOD[J].Acta Physica Sinica,1999,48(5):955-960.
Authors:WANG JIAN-HUZ  YUAN RUN-ZHANG  WU QIN-CHONG  REN ZHAO-XING
Abstract:Epitaxial growth of ZnO film on sapphire substrate has important applications in surface acoustic wave and acousto-optical transducers. An epitaxial ZnO film has been grown on a (0112) sapphire substrate using ECR plasma sputtering method at a substrate temperature of 380℃. The film is colourless, transparent and surface smooth. In order to explore the relationship between the deposition parameter and crystal structure of ZnO film, it have been studied that epitaxied growth of ZnO film in different substrate temperatures and deposition rates by XRD method.
Keywords:
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