| 束参量对X射线照射量的影响 |
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| 引用本文： | 施将君.束参量对X射线照射量的影响[J].强激光与粒子束,1995,7(4):613-618. |
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| 作者姓名： | 施将君 |
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| 作者单位： | 西南流体物理研究所,成都523信箱．610003 |
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| 摘 要： | 用蒙特卡洛方法来讨论束参量（半径、发射度和能量)对轫致辐射照射量的影响．结果表明，当束击靶半径一定时，靶正前方一米处的照射量X1随发射度增加而减小；当发射度一定时，照射量先随半径增加而急速增加，在束半径大于Rbm后，随半径进一步的增加而缓慢降低．也研究了束参量对照射量角分布的影响．因为使用了电子束的K—V分布，所得X1值是偏于保守的．
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| 关 键 词： | X射线照射量 蒙特卡洛法 束参量 K-V分布 轫致辐射角分布 电子束发射度 相椭圆 |
EFFECTS OF BEAM PARAMETERS ON X-RAY EXPOSURE |
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| Shi Jiangjun.EFFECTS OF BEAM PARAMETERS ON X-RAY EXPOSURE[J].High Power Laser and Particle Beams,1995,7(4):613-618. |
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| Authors: | Shi Jiangjun |
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| Abstract: | Effects of electron beam parameters,including radius,emittance and en-ergy, on bremsstrahlung exposure are discussed in this paper.It is shown that, in fixed beam radius,the larger the beam emittance,the smaller the exposure X_1at 1m in front of the target,and that in fixed emittance,the exposure quickly increases when the beam radius increases from 0 to R_(bm)then it slowly decreases as the radius becomes large fur-ther.Effects of them on angular distribution of the exposure are also exposed. Because of using K-V beam distribution,the results for X_1 are conservative, |
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| Keywords: | X-ray exposure K-V distribution e-beam emittanee phase el-lipse |
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