Evolution from (110) Fe to (111) Fe3O4 thin films grown by magnetron sputtering using Fe2O3 target |
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| Authors: | XJ Wu ZZ Zhang QS Liang J Meng |
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| Institution: | 1. State Key Laboratory of Rare Earth Resources Utilization, Changchun Institute of Applied Chemistry, Chinese Academy of Sciences, 5625 Renmin Street, Changchun 130022, People''s Republic of China;2. State Key Laboratory of Luminescence and Applications, Changchun Institute of Optics, Fine Mechanics and Physics, Chinese Academy of Sciences, 3888 Dongnanhu Road, Changchun 130033, People''s Republic of China |
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| Abstract: | Fe and Fe3O4 thin films were grown by radio frequency magnetron sputtering. Fe2O3 was used as the target and hydrogen was introduced together with Argon gas to provide a certain reducing atmosphere. By varying H2/Ar flow ratio, the changes in composition and structure of the thin films from (110) Fe to (111) Fe3O4 were observed by X-ray diffraction. The valence states of Fe in the thin films were analyzed by X-ray photoelectron spectroscopy. Magnetization measurements indicate that the Fe thin films grown with low H2/Ar flow ratios possess large coercive force. It was ascribed to the increasing boundary density and the increasing amount of Fe oxides such as FeO distributed at the boundary. |
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