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Chemical deposition of smooth nanocrystalline Y2O3 films from solutions of metal-organic precursors |
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| Authors: | I. A. Martynova D. M. Tsymbarenko A. A. Kamenev S. N. Mudretsova A. N. Streletsky A. L. Vasiliev N. P. Kuzmina A. R. Kaul |
| Affiliation: | 1. Department of Chemistry, M. V. Lomonosov Moscow State University, Bldg. 3, 1 Leninskie Gory, 119991, Moscow, Russian Federation 2. SuperOx, Ltd., Bldg. 2, 20 Nauchnyj Proezd, 117246, Moscow, Russian Federation 3. Semenov Institute of Chemical Physics, Russian Academy of Sciences, 4 ul. Kosygina, 119991, Moscow, Russian Federation 4. National Research Centre “Kurchatov Institute”, 1 pl. Akad. Kurchatova, 123182, Moscow, Russian Federation |
| Abstract: | A series of (Y(AcO)3·4H2O—Q—Solv) solutions (Q is monoethanolamine (MEA), diethanolamine (DEA), en, dien; Solv = MeOH, EtOH, PriOH, BuOH) was studied to choose the metal-organic precursor for surface smoothing treatment of metallic tapes by chemical deposition of nanocrystalline yttria films. Based on the results of viscosity, wetting angle, and thermal stability measurements, a solution (Y(AcO)3·4H2O—dien—PriOH) was proposed as a new metal-organic precursor. After chemical deposition of nanocrystalline yttria films about 300 nm thick on a Hastelloy C-276 metallic tape the surface roughness was reduced by a factor of 11 (from 9.0 to 0.8 nm on a surface area of 5×5 μm2). |
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