| 甲酚醛树脂—HMMM负性水型化学增幅抗蚀剂的研究 |
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| 引用本文： | 吴兵,李元昌,陈明,林天舒,洪啸吟,焦晓明,程爱萍,陈建军. 甲酚醛树脂—HMMM负性水型化学增幅抗蚀剂的研究[J]. 影像科学与光化学, 1998, 16(2): 154-160. DOI: 10.7517/j.issn.1674-0475.1998.02.154 |
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| 作者姓名： | 吴兵 李元昌 陈明 林天舒 洪啸吟 焦晓明 程爱萍 陈建军 |
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| 作者单位： | 1. 清华大学化学系, 北京100084;2. 北京化学试剂所, 北京100022 |
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| 基金项目： | 国家自然科学基金资助项目(批准号:59633110) |
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| 摘 要： | 本文利用二苯碘 盐为光敏产酸物,吩噻嗪为敏化剂,配制了一种甲酚醛树脂——六甲氧基甲基三聚氰胺(HMMM)负性水型紫外化学增抗蚀剂,并研究了光敏产酸物和增感剂对体系光敏性的影响及体系中存在的拉平效应,通过优化后的光刻工艺条件得到了分辨率为1.24μm的光刻图形。
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| 关 键 词： | 化学增幅抗蚀剂 光敏产酸物 增感剂 |
| 收稿时间： | 1997-07-17 |
THE STUDY ON A KIND OF WATER-BASED NEGATIVE CHEMICAL AMPLIFIED PHOTORESIST BASED ON NOVOLAC-HMMM SYSTEM |
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| WU Bing,LI Yuanchang,CHEN Ming,LIN Tianshu,HONG Xiaoyin,JIAO Xiaoming,CHENG Aiping,CHEN Jianjun. THE STUDY ON A KIND OF WATER-BASED NEGATIVE CHEMICAL AMPLIFIED PHOTORESIST BASED ON NOVOLAC-HMMM SYSTEM[J]. Imaging Science and Photochemistry, 1998, 16(2): 154-160. DOI: 10.7517/j.issn.1674-0475.1998.02.154 |
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| Authors: | WU Bing LI Yuanchang CHEN Ming LIN Tianshu HONG Xiaoyin JIAO Xiaoming CHENG Aiping CHEN Jianjun |
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| Affiliation: | 1. Department of Chemistry, Tsinghua University, Beijing 100084, P. R. China;2. The Institute of Chemical Reagent, Beijing 100022, P. R. China |
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| Abstract: | A kind of water-based negative chemical amplified photoresist, composed of Novolac HMMM as the film former, and diphenyliodonium salt as the photosensitive acid generator and phenothiazine as the photosensitizer, was formulated. The effects of photosensitive acid generators and photosensitizers on the photosensitivity of this system, and the levelling-effect in this system were investigated. Based on our research results, the pattern with line width as low as 1.24 μm was gained with the conventional UV photolithography under the optimum parameters. |
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| Keywords: | chemical amplified photoresist photosensitive acid generator photosensitizer |
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