首页 | 本学科首页   官方微博 | 高级检索  
     


Microwave and RF surface wave sustained discharges as plasma sources for plasma chemistry and plasma processing
Authors:M. Chaker  M. Moisan  Z. Zakrzewski
Affiliation:(1) Département de Physique, Université de Montréal, H3C 3J7 Montréal, Québec;(2) Present address: Polish Academy of Sciences, IMP-PAN, 80-952 Gdansk, Poland
Abstract:The surface wave produced plasma belongs to a class of RF and microwave induced plasmas. It results from the propagation of an electromagnetic wave which uses the plasma column it sustains and the plasma tube as its sole propagating media. This type of plasma offers several advantages compared to the positive column plasma of dc discharges or to other RF and microwave produced plasmas. Surface wave plasmas require no internal electrodes, and they can be applied over an extremely broad range of wave frequencies (27 MHz to 10 GHz demonstrated) and gas pressures (about 10–4 Torr to a few times the atmospheric pressures). Using the surface wave plasma technique, a large variety of plasma column diameters have been created (0.5–150 mm demonstrated) and no limitation on plasma column length (column up to 6 m long demonstrated) has been found. The surface wave produced plasma is used in elemental analysis and to sustain emission in lasing media. This article is intended as a guide for potential users of surface wave plasmas in the field of plasma processing and plasma chemistry.
Keywords:Plasma  RF  microwave discharges  low pressure  high pressure  atmospheric pressure  radial density distributions  surface wave
本文献已被 SpringerLink 等数据库收录!
设为首页 | 免责声明 | 关于勤云 | 加入收藏

Copyright©北京勤云科技发展有限公司  京ICP备09084417号