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GaAs(001)表面外延生长Mn薄膜的XPS研究
引用本文:徐敏,朱兴国,张明,董国胜,金晓峰. GaAs(001)表面外延生长Mn薄膜的XPS研究[J]. 物理学报, 1996, 45(7): 1178-1184
作者姓名:徐敏  朱兴国  张明  董国胜  金晓峰
作者单位:复旦大学李政道物理学综合实验室,应用表面物理国家重点实验室,上海200433;浙江工业大学基础部,杭州310014;复旦大学李政道物理学综合实验室,应用表面物理国家重点实验室,上海200433;复旦大学李政道物理学综合实验室,应用表面物理国家重点实验室,上海200433;复旦大学李政道物理学综合实验室,应用表面物理国家重点实验室,上海200433
基金项目:国家自然科学基金资助的课题
摘    要:利用x射线光电子能谱的深度剖面技术,对不同衬底温度下分子束外延生长的Mn薄膜及其与GaAs(001)衬底间的界面进行了元素组分和化学结合状态随深度变化的研究。实验发现衬底温度等于400K时制备的fcc-Mn/GaAs(001)体系中,fcc-Mn层与GaAs衬底之间存在一层较厚的Mn-Ga-As的缓冲层;衬底温度等于300K(室温)时制备的a-Mn/GaAs(001)体系中也存在类似的缓冲层,但它的厚度与fcc-Mn的情形相比要小得多;而当衬底温度等于450K时制备的体系在GaAs衬底之上全部是Mn-Ga

关 键 词:砷化镓 外延生长 锰 薄膜
收稿时间:1995-04-03

AN XPS STUDY OF Mn THIN FILMS GROWN ON GaAs(001l) SURFACE
XU MIN,ZHU XING-GUO,ZHANG MING,DONG GUO-SHENG and JIN XIAO-FENG. AN XPS STUDY OF Mn THIN FILMS GROWN ON GaAs(001l) SURFACE[J]. Acta Physica Sinica, 1996, 45(7): 1178-1184
Authors:XU MIN  ZHU XING-GUO  ZHANG MING  DONG GUO-SHENG  JIN XIAO-FENG
Abstract:The composition depth profiles of the Mn thin films grown on GaAs(00l) surface using MBE technique are studied with X-ray photoelectron spectroscopy(XPS) . The experimental results show that the fcc-Mn/GaAs(001) system grown on a 400 K substrate has a sandwich structure with a Mn-Ga-As buffer layer located between the fcc-Mn layer and the GaAs substrate; the α-Mn/GaAs (001) system grown on a 300 K substrate also has a similar buffer layer which is much thinner than that of the fcc-Mn/GaAs(001) system;and the system grown on a 450 K substrate is a Mn-Ga-As alloy beyond the GaAs substrate and it has no Mn-dominated area. It is concluded that to keep the substrate at a proper temperature(400 K) during growth to obtain a suitable thickness of buffer layer is an essential requirement to grow fcc-Mn on GaAs(00l) surface.
Keywords:
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