首页 | 本学科首页   官方微博 | 高级检索  
     检索      

Ni/NiO界面的高场磁化研究
引用本文:王文鼐,蒋正生,桑海,程光熙,葛翔,都有为.Ni/NiO界面的高场磁化研究[J].物理学报,1996,45(1):140-145.
作者姓名:王文鼐  蒋正生  桑海  程光熙  葛翔  都有为
作者单位:南京大学固体微结构国家重点实验室,微结构科学技术高等研究中心
摘    要:报道在表面包覆NiO的Ni超微颗粒和Ni/NiO多层膜中Ni/NiO界面的磁性实验结果.在T<80K下Ni/NiO界面存在较大的磁化强度(H=40kOe),并随温度上升而快速下降.对高场磁化(5-65kOe)实验数据进行拟合,结果表明Ni/NiO界面存在类似磁矩排列不一致的结构. 关键词

关 键 词:多层膜  镍/氧化镍  界面  磁化强度
收稿时间:1994-09-28

APPROCHING TO SATURATION OF Ni/NiO INTERFACE
WANG WEN-NAI,JIANG ZHENG-SHENG,SANG HAI,CHENG GUANG-XU,GE XIANG and DU YOU-WEI.APPROCHING TO SATURATION OF Ni/NiO INTERFACE[J].Acta Physica Sinica,1996,45(1):140-145.
Authors:WANG WEN-NAI  JIANG ZHENG-SHENG  SANG HAI  CHENG GUANG-XU  GE XIANG and DU YOU-WEI
Abstract:The magnetic properties investigated by experiment on the Ni/NiO interface of Ni/NiO multi-thin layers and surface-NiO-coated Ni ultra fine particles are reported. At temperatures below 80 K, an abnormal enhanced magnetization under external magnetic field (H = 40kOe) was found. The enhanced magnetization decreases quickly with temperature increasing.The high field (5-65 kOe) magnetization (approching to saturation) of ultrafine particles and multi-thin layers were also measured. The fit results for experimental data indicate that the interface Ni/NiO in Ni/NiO UFP and Ni/NiO ML have inhomogenous spin structure.
Keywords:
本文献已被 CNKI 维普 等数据库收录!
点击此处可从《物理学报》浏览原始摘要信息
点击此处可从《物理学报》下载免费的PDF全文
设为首页 | 免责声明 | 关于勤云 | 加入收藏

Copyright©北京勤云科技发展有限公司  京ICP备09084417号