Radiation-induced conduction in quantum-confined p +-n silicon junctions

Electron-beam diagnostics are used to study the radiation-induced conduction of supershallow p ⁺-n silicon junctions obtained by nonequilibrium boron diffusion. Current-voltage (I–V) characteristics of radiation-induced conduction of a both forward-and reverse-biased p ⁺-n junction are demonstrated for the first time, which has been made possible by the presence of self-organized transverse quantum wells inside a supershallow p ⁺ diffusion profile. The variation of the dark-current I–V characteristics with electron irradiation dose shows that formation of self-organized longitudinal quantum wells inside supershallow p ⁺ diffusion profiles favors an increase of the breakdown voltage in p ⁺-n silicon junctions. Fiz. Tverd. Tela (St. Petersburg) 41, 1871–1874 (October 1999)