High-quality binary fringe generation via joint optimization on intensity and phase |
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| Institution: | 1. Department of Materials Science and Engineering, The Ohio State University, 2041 College Rd., Columbus, OH 43210, United States;2. Robotics Institute, School of Mechanical Engineering and Automation, Beihang University, Beijing 100191, PR China;1. University of Chinese Academy of Sciences, Beijing 100049, China;2. School of Computer Science & Technology, Sichuan University, Chengdu 610064, China;3. The Institute of Optics and Electronics, Chinese Academy of Science, Chengdu 610209, China;1. College of Ocean Science and Engineering, Shanghai Maritime University, Shanghai 201306, PR China;2. Key Laboratory of Digital Earth Science, Institute of Remote Sensing and Digital Earth, Chinese Academy of Sciences, Beijing 100094, PR China;3. Department of Mechanics and Engineering Science, College of Engineering, Peking University, Beijing 100871, PR China;1. Ultrasound Elasticy Imaging Laboratory (UEIL), Department of Biomedical Engineering, Columbia University, 51 Engineering Terrace 1210 Amsterdam Avenue, New York 10031, USA;2. Biophysics and Biomedical Physics Laboratory (Bimef), Department of Physics, Antwerp University, 171 Groenenborgerlaan; Antwerp, Antwerp 2020, Belgium;3. Laser and Fiber Electronics Group (LFEG), Wroclaw University of Technology, Wybrzeze Wyspianskiego 27, Lower Silesia, Wroclaw 50-372, Poland;1. Division of Digital Media Technology, Sangmyung University, Seoul, 110-743, South Korea;2. Department of Optometry, Eulji University, 553, Sanseong-daero, Sujeong-gu, Seongnam-si, Gyonggi-do, South Korea |
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| Abstract: | There have been active studies on optimized dithering techniques to improve 3D shape measurement quality with defocused projectors. These techniques optimize the fringe quality in either phase domain or intensity domain according to their objective functions. Phase based optimization is direct and effective, but is sensitive to projector defocus levels. Intensity based optimization is robust to projector defocus levels, but it does not fully improve the phase quality. This paper presents a joint optimization technique to combine the merits of both the intensity and phase based optimization, which includes a pre-intensity optimization and a further optimization based on the synthesized error function. Then this technique is implemented in two frameworks, the whole-fringe optimization and the best-patch optimization, to generate binary fringe patterns. Both simulations and experiments show that the proposed technique can generate binary fringe patterns with high phase quality and robustness to projector defocus levels. |
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