Tilt-insensitive film thickness measurement using a double twin-path interferometer |
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Authors: | K. Hane K. Yoneda S. Hattori |
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Abstract: | A lock-in amplifier detection method for measuring the film thickness on a flat substrate has been developed by using a common-path interferometer. The signal due to the film thickness has been obtained without it being affected by the tilting of the substrate. The sensitivity was better than 0.5 nm. |
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Keywords: | interferometry thin films thickness measurement |
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