Electrochromic properties of sputtered TiO2 thin films |
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Authors: | C. M. Wang S. Y. Lin |
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Affiliation: | (1) Department of Electrical Engineering, Cheng Shiu University, No.840, Chengcing Rd., Niaosong Township, Kaohsiung County 833, Taiwan, Republic of China |
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Abstract: | TiO2 thin films were deposited on ITO/Glass substrates by the rf magnetron sputtering in this study. The electrochromic properties of TiO2 films were investigated using cyclic voltammograms (CV), which were carried out on TiO2 films immersed in an electrolyte of 1 M LiClO4 in propylene carbonate (PC). As- deposited TiO2 thin film was amorphous, while the films post-annealed at 300~600°C contained crystallized anatase and rutile. With the increase of the annealing temperature, the surface roughness of film increased from 1.232 nm to 1.950 nm. Experimental results reveal that the processing parameters of TiO2 thin films will influence the electrochromic properties such as transmittance, ion-storage capacity, inserted charge, optical density change, coloration efficiency and insertion coefficient. |
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Keywords: | Titanium dioxide Electrochromic Transmittance Cyclic voltammogram rf magnetron sputtering |
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