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An analytical model to predict diffusion induced intermetallic compounds growth in Cu-Sn-Cu sandwich structures
Institution:Institute of Electronic Engineering,China Academy of Engineering Physics,Mianyang 621999,China;School of Mechanics,Civil Engineering and Architecture,Northwestern Polytechnical University,Xi'an 710072,China;Department of Civil and Environmental Engineering,Northwestern University,Evanston,IL 60208,USA
Abstract:A mass diffusion model is developed to describe the growth kinetics of Cu_6Sn_5 intermetallic compounds(IMC) in the Cu-Sn-Cu sandwich structure. The proposed model is based on the local interfacial mass conversation law where interfacial Cu/Sn reactions and atomic diffusion are considered. Theoretical analysis shows that the IMC thickness growth is proportional to the square root of the product of the diffusion coefficient and time. The proposed model can explain the polarity effect of electromigration on kinetics of IMC growth where all the parameters have clear physical meaning. The theoretical predictions are compared with experimental results and show reasonable accuracy.
Keywords:Intermetallic compounds  Polarity effect  Electromigration  Diffusion  Size effect
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