Chemical characterization of plasma-polymerized films from acetylene and nitrogen-containing mixtures and their ethanol vapor sensitivity |
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| Institution: | 1. Department of Materials Engineering, Tatung University, 40 ChungShan N. Rd., 3rd Sec., Taipei 104, Taiwan, ROC;2. Department of Chemical Engineering, Chung Yuan Christian University, Chung-Li 320, Taiwan, ROC;3. Department of Materials and Mineral Resources Engineering, National Taipei University of Technology, Taipei 106, Taiwan, ROC;1. School of Chemistry and Materials Science, Huaibei Normal University, Huaibei 235000, PR China;2. School for the Gifted Young, University of Science and Technology of China, Hefei 230026, PR China;1. Tecnológico de Estudios Superiores de Ecatepec, TESE, Av. Tecnológico S/N C.P. 55210 Col. Valle de Anáhuac, Ecatepec de Morelos, Estado de México, Mexico;2. Universidad Autónoma Metropolitana-Iztapalapa, Depto. Física, Av. San Rafael Atlixco No. 186, Col. Vicentina, Iztapalapa 09340, Mexico |
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| Abstract: | In this study, plasma-polymerized thin films were prepared from plasma enhanced chemical vapor deposition (PECVD) of acetylene (C2H2), acetylene/nitrogen (C2H2/N2), or acetylene/ammonia (C2H2/NH3). When N2 or NH3 was mixed with C2H2 in the feed, the films were identified to contain all elements of the mixture and the properties of the films were implied by the C–H bonds and nitrogen functionalities. As shown by X-ray photoelectron spectroscopy (XPS) the N]/C] atomic ratio varies by changing the mixture composition and reaches a maximum of 0.12 for mixing C2H2 with NH3. It is found that the resistance of the thin film sensors prepared from C2H2, C2H2/N2, and C2H2/NH3 is distinctly decreased by over 2 orders of magnitude by the adsorption of ethanol vapor. |
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