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活化Mo-Mn法中低温烧成技术研究
引用本文:朴文博,李迎迎,黄亦工,崔高鹏.活化Mo-Mn法中低温烧成技术研究[J].真空电子技术,2022(1):61-66.
作者姓名:朴文博  李迎迎  黄亦工  崔高鹏
作者单位:北京真空电子技术研究所
摘    要:以降低活化Mo-Mn法烧成温度为目的,利用MnO-Al2O3-SiO2相图,设计了17组金属化配方,通过拉力测试、X射线衍射物相分析、扫描电镜测试及能谱分析,研究了不同活化剂配方对金属化层力学性能及显微结构的影响。本试验成功将活化Mo-Mn法烧结温度降低至1350℃,得到的金属化层显微结构致密均匀,力学性能及气密性良好,其三点封接强度可达470 MPa,远超行业标准。

关 键 词:活化Mo-Mn法  中低温  相图  活化剂  玻璃相

Study on Medium and Low Temperature Sintering Technology of Activated Mo-Mn Process
PIAO Wen-bo,LI Ying-ying,HUANG Yi-gong,CUI Gao-peng.Study on Medium and Low Temperature Sintering Technology of Activated Mo-Mn Process[J].Vacuum Electronics,2022(1):61-66.
Authors:PIAO Wen-bo  LI Ying-ying  HUANG Yi-gong  CUI Gao-peng
Institution:(Beijing Vacuum Electronics Research Institute,Beijing 100015,China)
Abstract:In order to decrease the sintering temperature of activated Mo-Mn methods,17 groups of metallization formulations based on MnO-Al2O3-SiO2 phase diagram were designed,and the effects of different activator formulations on the mechanical properties and microstructure of metallization layers were studied by tensile test,XRD,SEMand EDS.In the experiment,the sintering temperature of the activated Mo-Mn method was decreased to 1350℃,and the microstructure of the metallized layer was compact and uniform with good mechanical properties and air tightness.The three-point sealing strength of the metallized layer reached 470 Mpa,far exceeding the industry standard.
Keywords:Activated Mo-Mn method  Medium and low temperature  Phase diagram  Activator  Glassy phase
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