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High Reactivity of CH2 Radical in an AR–CH4 Post-Discharge |
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| Authors: | Jauberteau J. L. Thomas L. Aubreton J. Jauberteau I. Catherinot A. |
| Affiliation: | (1) URA 320 CNRS, Der des Sciences, 123 av A. Thomas, 87060 Limoges, France |
| Abstract: | Plasma Chemistry and Plasma Processing - This work is devoted to the study of the reactivity of CH 2 radical in the post-discharge of an Ar–CH 4 microwave plasma. These radicals are... |
| Keywords: | Microwave plasma post-discharge CH2 reactivity argon metastable density |
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