Aberration Functions for Microlithographic Optics |
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Authors: | Tomoyuki Matsuyama |
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Affiliation: | (1) Projection Lens Development Department, Nikon Corporation, 201-9 Miizugahara, Kumagaya 360-8559, Japan |
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Abstract: | In this paper a newly proposed polynomial series for aberration expression is reviewed. The new series can be utilized to express aberration distribution of a high NA and wide field optical system like a microlithographic projection lens. Moreover, the new aberration functions can be used for the microlithographic lens manufacturing process because they can express each aberration component of a rotationally symmetric system with a small amount of decentering error and astigmatic (toric) error. |
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Keywords: | microlithographic lens aberration functions Zernike polynomials wavefront aberration tolerancing |
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