Energy characteristics and deposition rates of metals from vacuum laser plasma on dielectric substrates

The effect of the energy flux density of a pulsed Kr-F laser on the processes of generation of the laser plasma of tin, palladium and platinum and on the deposition rates of metal films on dielectric substrates in laser ablation have been studied. The use of the differential scheme of probing a laser plasma with Faraday cups and time-of-flight mass spectrometry has made it possible to distinguish, in plasma ion signals, the ranges of singly charged and multicharged ions, which differ in kinetic energy. The film deposition rate depends on both the laser energy flux density and the degree of ionization of the laser plasma.