首页 | 本学科首页   官方微博 | 高级检索  
     检索      

直流弧光放电化学气相沉积(CVD)法制备金刚石薄膜及其等离子体的光发射谱原位测量
引用本文:张仿清,张亚非,杨映虎,李敬起,陈光华,蒋翔六.直流弧光放电化学气相沉积(CVD)法制备金刚石薄膜及其等离子体的光发射谱原位测量[J].物理学报,1990,39(12):1965-1969.
作者姓名:张仿清  张亚非  杨映虎  李敬起  陈光华  蒋翔六
作者单位:兰州大学物理系,兰州,730001;兰州大学物理系,兰州,730001;兰州大学物理系,兰州,730001;兰州大学物理系,兰州,730001;兰州大学物理系,兰州,730001;北京市科学技术研究院,北京,100044
摘    要:应用直流弧光放电分解CH4和H2混合气体成功地实现了高速生长多晶金刚石膜,应用扫描电子显微镜、X射线衍射仪、Raman谱仪对所得样品进行检测和分析,为了弄清楚金刚石膜的生长机理,在实际生长环境下“原位”测量了不同条件下直流弧光等离子体的光发射谱,结果发现:高速生长金刚石膜的关键是该气相反应中有大量的原子H存在。


PREPARATION OF DIAMOND FILMS BY DC ARC DISCHARGE AND IN SITU MEASUREMENTS OF THE PLASMA BY OPTICAL EMISSION SPECTRA
ZHANG FANG-QING,ZHANG YA-FEI,YANG YING-HU,LI JING-QI,CHEN GUANG-HUA and JIANG XIANG-LIU.PREPARATION OF DIAMOND FILMS BY DC ARC DISCHARGE AND IN SITU MEASUREMENTS OF THE PLASMA BY OPTICAL EMISSION SPECTRA[J].Acta Physica Sinica,1990,39(12):1965-1969.
Authors:ZHANG FANG-QING  ZHANG YA-FEI  YANG YING-HU  LI JING-QI  CHEN GUANG-HUA and JIANG XIANG-LIU
Abstract:High quality diamond films have been rapidly synthesised by the DC arc discharge plasma CVD in a hydrogen-methane mixture gas. The properties of the films are tested and analyzed by scanning electron microscopy, X-ray diffraction and Raman spectra. In order to find out the growth mechanism of vapor deposited diamond, in situ optical emission spectra of plasma under practical growth conditions are measured. It is found that the key factor of rapid growth diamond film is the presence of a large number of atomic hydrogen in the plasma.
Keywords:
本文献已被 CNKI 等数据库收录!
点击此处可从《物理学报》浏览原始摘要信息
点击此处可从《物理学报》下载免费的PDF全文
设为首页 | 免责声明 | 关于勤云 | 加入收藏

Copyright©北京勤云科技发展有限公司  京ICP备09084417号