| 金刚石膜合成条件下的鞘层与等离子体参数分布 |
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| 引用本文： | 詹如娟 江习承. 金刚石膜合成条件下的鞘层与等离子体参数分布[J]. 核聚变与等离子体物理, 1996, 16(3): 60-64 |
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| 作者姓名： | 詹如娟 江习承 |
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| 作者单位： | 中国科学技术大学近代物理系 |
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| 摘 要： | 本文报导了在用热阴极直流放电等离子体化学气相沉积（通常也称ＥＡＣＶＤ．即电子辅助化学气相沉积）方法合成金刚石的条件下的等离子体密度、电子温度、等离子体空间电位分布及基片附近等离子体鞘结构，并讨论其对成膜的影响．
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| 关 键 词： | 等离子体密度 等离子体鞘层 金刚石膜 |
THE PROFILES OF SHEATH STRUCTURE AND PLASMA PARAMETERS DURING SYNTHESIS OF DIAMOND FILMS |
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| ZHAN Rujuan, JIANG Xicheng, YAO Dongsheng, WEN Xiaohui, DING Weixing. THE PROFILES OF SHEATH STRUCTURE AND PLASMA PARAMETERS DURING SYNTHESIS OF DIAMOND FILMS[J]. Nuclear Fusion and Plasma Physics, 1996, 16(3): 60-64 |
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| Authors: | ZHAN Rujuan JIANG Xicheng YAO Dongsheng WEN Xiaohui DING Weixing |
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| Abstract: | The plasma density, electron temperature and plasma potential are measured by Langmuir double probes and an emission probe during synthesis of diamond films with EACVD.The profiles of plasma parameters and the sheath structure near the Substrate are presented.The influence of plasma parameters on the diamond films is also discussed. |
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| Keywords: | Electron temperature Plasma sheath Diamond film |
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