| 极紫外多层膜制备工艺研究 |
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| 引用本文： | 王占山,马月英.极紫外多层膜制备工艺研究[J].光学技术,2001,27(6):532-534. |
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| 作者姓名： | 王占山 马月英 |
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| 作者单位： | 1. 同济大学物理系,
2. 中国科学院长春光学精密机械与物理研究所, |
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| 摘 要： | 介绍了用平面磁控溅射方法制备极紫外多层膜的研究工作。围绕极紫外多层膜技术 ,重点探讨了多层膜膜厚定标和工艺过程对多层膜结构和内部成分的影响。为深入研究多层膜制备工艺指明了方向。
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| 关 键 词： | 极紫外 多层膜 磁控溅射 |
| 文章编号： | 1002-1582(2001)06-0532-03 |
| 修稿时间： | 2001年5月24日 |
Researches on extreme ultraviolet multilayers fabrication |
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| WANG Zhan-shan ,MA Yue-ying.Researches on extreme ultraviolet multilayers fabrication[J].Optical Technique,2001,27(6):532-534. |
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| Authors: | WANG Zhan-shan MA Yue-ying |
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| Institution: | WANG Zhan-shan 1,MA Yue-ying 2 |
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| Abstract: | Researches in making Extreme multilayers by magnetron sputtering are represented. For depositing multilayers, the determination of deposition speed of Mo and Si is finished. A variety of techniques are used to test the structure and composition of multilayers, including X-ray diffraction, Rutherford backscattering spectroscopy, and Auger depth profiling. The results will be directed for making high quality multilayers. |
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| Keywords: | Extreme ultraviolet multilayers magnetron sputtering |
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