Controlled thermal decomposition of NaSi to derive silicon clathrate compounds |
| |
Authors: | Hiro-omi Horie |
| |
Affiliation: | Department of Applied Chemistry, Graduate School of Engineering, Hiroshima University, Higashi-Hiroshima 739-8527, Japan |
| |
Abstract: | Formation conditions of two types of sodium containing silicon clathrate compounds were determined by the controlled thermal decomposition of sodium monosilicide NaSi under vacuum. The decomposition began at 360 °C. Much higher decomposition temperatures and the presence of sodium metal vapor were favorable for the formation of type I clathrate compound Na8Si46. Type II clathrate compound NaxSi136 was obtained as a single phase at a decomposition temperature <440 °C under the condition without sodium metal vapor. The type I clathrate compound was decomposed to crystalline Si above 520 °C. The type II clathrate compound was thermally more stable, and retained at least up to 550 °C in vacuum. |
| |
Keywords: | Silicon clathrate Thermal decomposition Sodium monosilicide |
本文献已被 ScienceDirect 等数据库收录! |