Etched glass surfaces,atomic force microscopy and stochastic analysis |
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| Authors: | G.R. Jafari M. Reza Rahimi Tabar A. Iraji zad G. Kavei |
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| Affiliation: | 1. Department of Physics, Shahid Beheshti University, Evin, Tehran 19839, Iran;2. Department of Nano-Science, IPM, P.O. Box 19395-5531, Tehran, Iran;3. Department of Physics, Sharif University of Technology, P.O. Box 11365-9161, Tehran, Iran;4. CNRS UMR 6529, Observatoire de la Côte d’Azur, BP 4229, 06304 Nice Cedex 4, France;5. Material and Energy, Research Center, P.O. Box 14155-4777, Tehran, Iran |
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| Abstract: | The effect of etching time scale of glass surface on its statistical properties has been studied using atomic force microscopy technique. We have characterized the complexity of the height fluctuation of an etched surface by the stochastic parameters such as intermittency exponents, roughness, roughness exponents, drift and diffusion coefficients and found their widths in terms of the etching time. |
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| Keywords: | Etching process Rough surface Stochastic process |
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