Cross sections for electron trapping by DNA and its component subunits I: Condensed tetrahydrofuran deposited on Kr |
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Authors: | Park Yeun Soo Cho Hyuck Parenteau Luc Bass Andrew D Sanche Léon |
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Institution: | Department of Physics, Chungnam National University, 220 Gung-dong, Yuseong-gu, Daejeon 305-764, Korea. |
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Abstract: | We report cross sections for electron capture processes occurring in condensed tetrahydrofuran (THF) for incident electron energies in the range of 0-9 eV. The charge trapping cross section for 6-9 eV electrons is very small, and an upper limit of 4 x 10(-19) cm2 is estimated from our results. This latter is thus also an upper bound for the cross section for dissociative electron attachment process that is known to occur at these energies for condensed THF. At energies close to zero eV electron trapping proceeds via intermolecular stabilization. The cross section for this process is strongly dependent on the quantity of deposited THF. Since THF may model the furyl ring found in deoxyribose, these measurements indicate that this ring likely plays little role in either initiating or enhancing strand break damage via the attachment of the low energy secondary electrons produced when DNA is exposed to ionizing radiation. |
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