Heteroepitaxial growth of ZnS on GaP by the close-spaced technique

Heteroepitaxial growth of ZnS on GaP substrates was achieved with high growth rate by the close-spaced technique. Source temperatures were between 900 and 1150° C. The apparent enthalpy change of 36.6 kcal/mol obtained from the temperature dependence of the evaporation rate of source ZnS powder suggests that the material transport is carried out via the reaction between the source and hydrogen by diffusion and convection. The dependence of the growth rate on the substrate orientation is (100) > (111)Ga > (111)P, and the growth rates on these faces at a source temperature of 1000° C are about 1.6, 0.85, and 0.4 μm/min, respectively. The growth kinetics on the (111)Ga face are close to the mass transport limited case. The growth kinetics on the (111)P face are close to the surface reaction limited case, and that on the (100) face are almost the mass transport limited case. The surface morphology and X-ray analysis show that the crystal structure depends on the orientation of the substrate. The (0001) oriented α (hexagonal) modification of ZnS is obtained on the (111)Ga face, the (111) oriented β (cubic) modification on the (111)P face, and the (100) oriented β modification on the (100) face in the studied range of temperature.