硅表面分子刷图案化及生长DNA纳米管

结合“自上而下”和“自下而上”技术构建微纳米器件是目前纳米科学和技术领域追逐的目标之一。本文首先采用硅氢化反应在硅表面共价偶联引发聚合的活性基团,接着实施表面原子转移自由基聚合（ATRP）反应形成高分子刷poly（PEGMA）,采用“自上而下”的光刻技术在硅表面制备功能化的图案,最后利用“自下而上”的DNA自组装技术在图案部分原位生长DNA纳米管。上述组装过程通过多次透射反射红外光谱、凝胶电泳、透射电镜和扫描电镜进行了检测,证实了硅芯片表面定位生长DNA纳米管的可行性。

In-situ Growth of DNA Nanotubes from Functionalized Patterns of Poly(PEGMA) Brushes on Silicon Surface

Interfacing "top-down" with "bottom-up" methods to fabricate micro-and nano-devices are one target in nano-science and nano-technology presently. Herein we demonstrate the combination of photolithography and self-assembly to grow DNA nanotubes on functionalized patterns of poly(poly(ethylene glycol)monomethacrylate) brushes grafted from a silicon chip surface (Si-g-Poly(PEGMA)). On the silicon surface, first, the bromoisobutyryl group as the polymerization initiator was introduced through hydrosilylation, then poly(PEGMA) brushes were grown in-situ by Surface Initiated Atom Transfer Radical Polymerization (SI-ATRP), NHS(succinimidyl)-ester was generated on photolithographied poly(PEGMA) patterns and finally six-helix DNA tubes were immobilized and grown in-situ on these patterns. Multiple transmission-reflection infrared spectroscopy (MTR-IR), gel electrophoresis, transmission electron microscopy (TEM), and scanning electron microscopy (SEM) were used to monitor and identify the whole process, which confirmed the feasibility of DNA self-assembly on the functionalized patterns of a silicon chip.