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Numerical Modeling of an Ar–H2 Radio-Frequency Plasma Reactor under Thermal and Chemical Nonequilibrium Conditions
Authors:Rubin Ye  Anthony B. Murphy  Takamasa Ishigaki
Affiliation:(1) Nano Ceramics Center, National Institute for Materials Science, 1-1 Namiki, Tsukuba Ibaraki, 305-0044, Japan;(2) CSIRO Industrial Physics, P.O. Box 218, Lindfield, NSW, 2070, Australia
Abstract:The species densities and the thermal and chemical nonequilibrium phenomena in an Ar–H2 radio frequency inductively coupled plasma reactor used for hydrogenation of materials have been investigated through numerical simulation. The mathematical model consists of a two-temperature fluid dynamics model and a chemical kinetics model that takes into account the effect of local chemical nonequilibrium. Computations are carried out for the rf plasma running at 11.7 kW and 27 kPa for different Ar–H2 mixtures and for pure argon. Predicted results for the electron and heavy-species temperatures, the species densities, as well as the degree of thermal and chemical nonequilibrium, are presented in detail. It is found that the electron and hydrogen atom densities in the reactor and in the near-wall region of the torch are strongly altered by nonequilibrium effects. The hydrogen atom density remains high in the reactor zone, and peaks in a region that has been found to be attractive for material processing. Deviations from thermal and chemical equilibrium are greatly reduced by the addition of hydrogen to an argon plasma.
Keywords:RF thermal plasmas  Thermal nonequilibrium  Chemical nonequilibrium  chemical kinetics  Species density
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