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Fabrication of LIGA masks for microfluidic analytical systems |
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| Authors: | B. G. Goldenberg T. N. Goryachkovskaya V. S. Eliseev N. A. Kolchanov V. I. Kondrat’ev G. N. Kulipanov V. M. Popik S. E. Pel’tek E. V. Petrova V. F. Pindyurin |
| Affiliation: | (1) Budker Institute of Nuclear Physics, Siberian Branch, Russian Academy of Sciences, pr. akademika Lavrent’eva 11, Novosibirsk, 630090, Russia;(2) Institute of Cytology and Genetics, Siberian Branch, Russian Academy of Sciences, pr. akademika Lavrent’eva 10, Novosibirsk, 630090, Russia |
| Abstract: | Preliminary results of fabrication and testing of LIGA mask samples for deep x-ray lithography in the spectral range of 3.5–13.5 keV are presented. The mask fabrication method is based on direct mask patterning with minimum element sizes of ≥ 10 μm by a synchrotron radiation x-ray microbeam. Such a method does not require an intermediate mask, which significantly simplifies fabrication and reduces the laboriousness and cost of LIGA masks. |
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