| 紫外激光SiO2减反膜的制备 |
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| 引用本文： | 张林,杜凯.紫外激光SiO2减反膜的制备[J].光学学报,1996,16(7):98-1001. |
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| 作者姓名： | 张林 杜凯 |
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| 作者单位： | 中国工程物理研究院核物理与化学研究所!成都610003 |
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| 基金项目： | 国家激光青年科学基金，中国工程物理研究院国防科技预研基金 |
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| 摘 要： | 介绍溶胶－凝胶制备ＳｉＯ２减反膜的溶液配制，基片清洗和膜层制备过程，利用正硅酸乙酯的碱性催化水解，通过浸入移液法在石英透镜的表面涂敷一层多孔ＳｉＯ２减反膜，涂膜后石英透镜的透过率在３５０ｎｍ波长处达到９８．０％以上。
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| 关 键 词： | 紫外激光 减反膜 溶胶－凝胶法 激光器 |
| 收稿时间： | 1994/12/10 |
Preparation of Silica Antireflective Coating for UV-Laser |
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| Zhang Lin, Du Kai, Zhou Lan, Tu Haiyan.Preparation of Silica Antireflective Coating for UV-Laser[J].Acta Optica Sinica,1996,16(7):98-1001. |
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| Authors: | Zhang Lin Du Kai Zhou Lan Tu Haiyan |
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| Abstract: | The preparation of silica antireflective coating through sol- gel process is discussed involving the composition of coating solution, cleaning of substrate and coating process. The porous silica film can be deposited on the silica lens by dipping from the solution, with the base catalyzed hydrolyzation of tetraeathyl silicate (TEOS ) in anhydrous ethyl alcohol. The transmission of coating on the silica lens is 98. 3 % at 350nm, and the peak transmission is over 99. 0%. |
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| Keywords: | sol-gel process antireflective coating UV-laser |
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