Submicron External Electro-optic Measuring System Based on an Electro-optic Solid Immersion Lens |
| |
| Authors: | Zhanguo Chen Gang Jia Yunlong Liu Zhifa Wu Chao Zhao Maobin Yi |
| |
| Affiliation: | (1) Department of Electronic Engineering, State Key Laboratory on Integrated Optoelectronics, Jilin University, Changchun, 130023, People's Republic of China |
| |
| Abstract: | In this paper, all electro-optic solid immersion lens (EOSIL) is introduced, which is made of GaAs. A reflecting external electro-optic measuring system based on the EOSIL is built. With a hemispherical GaAs EOSIL used as the external probe, 0.7 µm spot size is obtained when the wavelength of the probing beam from a laser diode is 1.3 µm and a microscope objective with 0.3 numerical aperture is used. The principle of the measuring system is analyzed by Jones matrix. By using the system, the electrical signals propagating on a microstrip transmission line are successfully measured. The voltage sensitivity about 5 mV/ is measured when 10 kHz sinusoidal electric signal is applied on the microstrip line. |
| |
| Keywords: | solid immersion lens electro-optic measurement spatial resolution sub-micron |
| 本文献已被 SpringerLink 等数据库收录！ |
